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Description

1. Can be used for UV and /or Ozone treatment of almost any surface.
2. Accepts samples up to 150 mm (6") diameter and 10 mm (3/8") thick.
3. Automatic process timer settable up to 99 min 59 sec.
4. Oxygen flow to ozone generator adjustable from 0 to 5 lpm.
5. Temperature adjustable from ambient to 300° C.

Applications

1. Removing organic contamination or residues.
2. Cleaning or stripping photoresist, inks or polyimide from substrates.
3. Pre-clean wafers prior to deposition.
4. Descumming photoresist and polyimide.
5. Modifying surfaces for better adhesion.
6. Improving lube coverage on magnetic discs.
7. UV curing.
8. Growing thin stable oxide films on silicon and gallium arsenide.
   
   Tool Manager: Brian Bowman
   

Manufacturers Website: Samco UV-1

This material is based upon work supported in part by the STC Program of the National Science Foundation under Agreement No. ECS-9876771. Any opinions, findings, and conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation.

Any opininons, findings, conclusions or recommendations expressed are those of the author(s) and do not necessarily reflect the views of the New York State Office of Science, Technology and Academic Research.

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