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EVG620 Nanoimprint/Microcontact-capable Mask Aligner
  1. I  line (365nm) precision photolithography tool.
  2. Double side mask alignment system for up to 100mm wafers.
  3. Soft contact, hard contact, vacuum contact, flood, and proximity exposure modes.
  4. Tooling and technical support for Microcontact Printing (µCP).
  5. Tooling and technical support for Nanoimprint lithography (NIL).
  6. Insertable UV filter for wavelengths below 350nm for improved SU8 imaging.

    Tool Manager: Brian Bowman
This material is based upon work supported in part by the STC Program of the National Science Foundation under Agreement No. ECS-9876771. Any opinions, findings, and conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation.
Any opininons, findings, conclusions or recommendations expressed are those of the author(s) and do not necessarily reflect the views of the New York State Office of Science, Technology and Academic Research.


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