An excimer laser is a specific type of molecular gas laser that produces high intensity light in the ultraviolet (UV) range of the electromagnetic spectrum. The UV light source is a Lumonics PM-848k excimer laser, which can be configured to operate with either a KrF (krypton-fluoride) gas mixture at 248 nm or an ArF (argon-fluoride) gas mixture at 193 nm. The excimer laser beam will be used for microfabrication in a wide range of absorbing materials. Any feature down to a size of 2 mm can be etched into a surface in a fraction of the processing time of standard photolithography. The range of applications will cover accurate and rapid scribing, drilling holes through the substrate, and creating complicated patterns and devices out silicon and plastics alike.
For more details go to: Excimer Laser Micromaching
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This material is based upon work supported in part by the STC Program of the National Science Foundation under Agreement No. ECS-9876771. Any opinions, findings, and conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation. |
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Any opininons, findings, conclusions or recommendations expressed are those of the author(s) and do not necessarily reflect the views of the New York State Office of Science, Technology and Academic Research. |
